Atomic layer deposition (ALD) continues to challenge our understanding of surface reactions with new chemistries and enabling applications where atomically precise layers significantly improve performance of devices. In this talk, I will first describe the work our group has conducted understanding the role of configurational entropy of adsorbed molecules in determining surface reactions in ALD that lead to growth of films one monolayer at a time. I will then describe several case studies where ALD provides the ideal process platform to characterize surfaces and develop new nanomaterials. Examples will highlight use of single monolayer passivation of surfaces, second-harmonics to study metal-induced gap states, extraction of plasmonically generated hot electrons from gold nanorods and development of transparent conducting zinc oxides with quenched point-defects.

Speaker(s): Prof. Parag Banerjee,

Agenda:

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Location:
Boise, Idaho