Optical measurements of thin films by ellipsometry using numerical methods
Invited Lecture by
Frank Urban, Ph.D.
Associate Professor, FIU
Date: December 9, 2014
Time: 2:00 PM– 3:00 PM
Address: Department of Electrical and Computer Engineering Department, Florida International University, 10555 W. Flagler Street, Miami, Florida 33174
Abstract: A major challenge for those utilizing ellipsometry is numerical processing of the measured data. Our recent work shows how the transcendental, multivalued equations arising from the physics of reflection from layers can be solved in the n-k plane. This approach applies the mathematics of Complex Analysis to solve the equations numerically. The work presented extends the n-k method to obtain solutions within the accuracy limit of each measurement. The system treated here is that of a thin absorbing film (Chromium) overlying a known substrate (Silicon). Solutions for a three-layer model of the Chromium film including film-substrate and film-air interfacial layers result in a mean square error (MSE) on the order of 0.01, a significant improvement over a single-layer mod-el. Relaxing the constraint of vertical homogeneity provides a six-layer model with the same interfacial layers and four sublayers of Chromium. The chromium layers have near-identical values of optical properties and an MSE of essentially zero (10-13). It is anticipated that additional methods will be needed for other classes of problems.
Short Bio: Professor Urban has been at FIU since Fall 1990. His interests are in nanoparticle thin films and optical measurements of thin films by ellipsometry using numerical methods. He has been active in the American Vacuum Society in the Thin Film and Surface Engineering Divisions.
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