April 16, 2013
Noon – 1  pm
Texas Instruments (TI) Auditorium E-1
2900 Semiconductor Drive
Santa Clara, CA

TITLE: Turning ALD Innovations into Successful Applications

SPEAKER: Brad Aitchison, Western US Sales Director, BeneQ Oy, Vantaa Finland

ABSTRACT:
Atomic Layer Deposition (ALD) has a myriad of applications including buffer layers, diffusion barriers, dielectrics for use in optics, electronics, medical, defense and a large number of other areas. ALD film thickness is independent of substrate geometry and can form uniform films on deep trenches, nano-structures, and 3D parts. It can form nanolaminates with sharp boundaries as well as nanoscale layers with graded composition . This talk will address the fundamentals of ALD processing including ALD on particles with a Fluidized Bed Reactor (FBR), as well as show how ALD is enabling new nanotechnology possibilities and novel materials and applications along with the already established applications in solar cells, OLED displays, flexible electronics, battery electrodes, decorative coatings, moisture barriers and anti-tarnish coatings, etc.

SPEAKER BIOGRAPHY:
Since mid 2012 Brad Aitchison has been Western US Sales Director for Beneq, a leading supplier of production and research equipment for thin film ALD and aerosol coatings, and a manufacturer of thin film electroluminescent (TFEL) displays. During the four years leading up to joining Beneq he was a Director of Engineering at Canatu, a leading edge nanotechnology company commercializing carbon nanomaterial thin films for the electronics, optics and energy sectors. Prior to that he contributed in Process Engineering roles for 18 years at Watkins-Johnson, ASM-Microchemistry, Planar Systems, and MLD Technologies. Brad received his BA in Physics at Willamette University, and an MS in Material Science Engineering at UCLA.

AGENDA:

• 11:30 am – Registration & light lunch (pizza & drinks)
• Noon – Presentation & Questions/Answers
• 1:00 pm – Adjourn