IEEE Transactions on Nanotechnology



The IEEE Transactions on Nanotechnology (TNANO) publishes novel and important results in engineering at the nanoscale.  

Article in focus: March-April 2017

From the January 2017 issue of IEEE Transactions on Nanotechnology

Negative Capacitance for Boosting Tunnel FET performance

by Masaharu Kobayashi ; Kyungmin Jang ; Nozomu Ueyama ; Toshiro Hiramoto
T-NANO, Vol. 16, Issue 2, pp. 253 – 258, January 2017.


Abstract: We have proposed and investigated a super steep subthreshold slope transistor by introducing negative capacitance of a ferroelectric HfO2 gate insulator to a vertical tunnel FET for energy efficient computing. The channel structure and gate insulator are systematically designed to maximize the Ion/Ioff ratio. The simulation study reveals that the electric field at the tunnel junction can be effectively enhanced by potential amplification due to the negative capacitance. The enhanced electric field increases the band-to-band tunneling rate and Ion/Ioff ratio, which results in 10x higher energy efficiency than in tunnel FET.


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Message from the Editor-In-Chief

by Fabrizio Lombardi


On December 31 2015, I completed the first year of my term as Editor-In-Chief (EIC); as you will read further in this editorial, I am pleased to report that the IEEE Transactions on Nanotechnology (TNANO) continues to strengthen its reputation and consolidate its role as the flagship Transactions of the IEEE Nanotechnology Council (NTC). 2015 has been an outstanding year for TNANO; Manuscript Central Scholar 1 reports the following very impressive statistics for the 2015 calendar year:

Number of submitted original papers: 647
Number of revised-and-resubmitted papers: 99
Total number of papers received: 746
Acceptance rate: 30.4%
Rejection rate: 51.6%
Revise-and-resubmit rate: 18%

All the above numbers are the absolute best in quantitative and qualitative terms (such as for the highest selectivity) in the 14 years of existence of TNANO and reflect the steady and continued growth in terms of quality and quantity of this periodical. (continue to read)

Information about TNANO

TNANO focuses on nanoscale devices, systems, materials and applications, and on their underlying science. It is an interdisciplinary journal that covers all areas of nanotechnology. The hardcopy version is published bi-monthly, but accepted papers are published on the web as soon as they are submitted in final form. TNANO is a publication of the IEEE Nanotechnology Council.

TNANO is a Hybrid Journal, which means that it allows either:

  • Traditional manuscript submission
  • Open Access (author-pays OA) manuscript submission at a discounted rate

 TNANO publishes Research Letters, Regular Papers, and Correspondence Items. Research Letters must not exceed three printed pages. They are subject to the same thorough review process as Regular Papers, but receive priority treatment. A Research Letter that is accepted without major revisions is expected to be published on the web within 4 to 6 weeks of its initial submission.

Areas covered by TNANO include, but are not limited to:

  • Nano and Molecular Electronics
  • Circuits and Architectures
  • Nanomagnetism and Spintronics
  • Nano-Optics, Nano-Optoelectronics and Nanophotonics
  • Nanorobotics and Nanoassembly
  • Nanosensors and Nanoactuators
  • Nanomechanics and Nanoelectromechanical Systems
  • Nanobiotechnology and Nanomedicine
  • Nanofabrication and Nanolithography
  • Nanometrology and Characterization
  • Computational Nanotechnology

Additional information on these is found here.